The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 1995
Filed:
Jul. 29, 1994
Applicant:
Inventor:
Shinji Matsui, Tokyo, JP;
Assignee:
NEC Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
430-1 ; 430-2 ; 430942 ; 359-1 ; 359-3 ; 250306 ; 250307 ; 250311 ;
Abstract
In a nanometer order dot pattern producing method and drawing apparatus by electron holography, a nanometer order dot pattern is readily produced with a high accuracy, using a pair of biprisms or multi-biprisms integrated as a unit so as to mutually cross. Each multi-biprism includes a plurality of biprisms arranged in parallel. Electric potentials of the integrated biprisms or multi-biprisms are independently controlled.
Matsui, Shinji. (1995). Method for producing nanometer order dot pattern by electron holography (U.S. Patent No. 5466548). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5466548
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile