The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 07, 1995
Filed:
Dec. 30, 1993
Francis L Merat, University Heights, OH (US);
Kavous Roumina, Westlake, OH (US);
Steven M Ruegsegger, Centerville, OH (US);
Robert B Delvalle, Cleveland Heights, OH (US);
Abstract
A computer is used for generating a part inspection plan for a coordinate measuring machine (CMM), in a feature-based rapid design system (RDS), having a Feature-Based Design Environment (FBDE), an Episodal Associative Memory (EAM), Fabrication Planning (FAB), and an Inspection Plan (INSP), with features which include form features (D1) which define the form or shape of the part, manufacturing features (D2), inspection features (D3), and geometric and design (GD&T) features (D4). The Inspection Plan (INSP) includes interaction means wherein the inspector interacts with the system to guide it to a desired result, and the inspector can define setups, measurement points, sequence for the points, and the via points. For the inspector's sequence input, a learning process is included, so that the inspector's desired sequence is sent to discovery means for organizing patterns and defining rules, which by recalling relevant past experiences, and learning from the inspector's input, creates a 'self-improving' expert system.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile