The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 1995
Filed:
Apr. 05, 1994
Benedictus Jansen, Geel, BE;
Andre Roefs, Kasterlee, BE;
Francis Sels, Kontich, BE;
Pieter Perdieus, O.L.V. Waver, BE;
Raymond Florens, Edegem, BE;
Agfa-Gevaert, N.V., Mortsel, BE;
Abstract
To eliminate the 'pi-line' artifact after processing a method of image formation is disclosed in a silver halide industrial X-ray photographic material, comprising on at least one side of a support, at least one gelatin silver halide emulsion layer and a total amount of silver halide, corresponding to from 6 to 20 g of silver nitrate per square meter and per side, and at least one non-sensitive protective antistress coating, wherein said material further comprises a hardening agent different from a vinyl sulphone compound, preferably formaldehyde, and at least one polyoxyalkylene compound as a surfactant in at least one of its hydrophilic layers, and wherein after exposure to direct X-rays said material is subjected in an automatic processing machine to the steps of developing in a developer comprising at least one anionic alkylphenoxy polyalkyleneoxy phosphate ester surfactant, fixing in a fixer which may comprise at least one alpha-ketocarboxylic acid, rinsing and drying.