The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 31, 1995

Filed:

Jan. 12, 1994
Applicant:
Inventors:

Mark D Matthews, Richardson, TX (US);

Louanne K Brown, Garland, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B01D / ;
U.S. Cl.
CPC ...
1566621 ; 2105121 ;
Abstract

Particles (10) contained in a mass of liquid etchant (12) and being wetted and etched thereby are moved into a mass of an inert, etching-terminating liquid (14) which abuts the etchant mass by overcoming surface tension forces exerted on the particles by the etchant at the interface (16,70) of the liquid masses. A vortex (24) of the inert liquid (14) is forced and in turn forces a conformal vortex (60) of the etchant (12) with the particles (10) therein. Turbulence at the interface (70) of the vortices (24,60) and vortex-generated centrifugal force on the particles (10) overcome the surface tension forces, and the particles move into the inert liquid (14).


Find Patent Forward Citations

Matthews, Mark. (1995). Method of treating particles (U.S. Patent No. 5462639). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5462639

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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