The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 31, 1995
Filed:
Aug. 25, 1993
Applicant:
Inventors:
Assignee:
Kawasaki Steel Corp., Hyogo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23F / ;
U.S. Cl.
CPC ...
156345 ; 216 71 ;
Abstract
A surface processing apparatus and a dry etching method using a neutral beam. The surface processing apparatus comprises a plasma chamber for generating a plasma P, a neutralizing chamber for converting an ion beam extracted from the plasma P by an ion extracting electrode into the neutral beam, and a processing chamber for introducing therein the neutral beam and etching a substrate S to be processed using the neutral beam. There is also provided a static electric field lens comprising two spaced first electrodes provided on the inner periphery of the neutralizing chamber and a second electrode interposed therebetween so as to obtain the neutral beams having low energy and high flux.