The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 1995
Filed:
Jun. 28, 1994
Applicant:
Inventors:
Masami Hayashida, Yokohama, JP;
Yutaka Watanabe, Isehara, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K / ;
U.S. Cl.
CPC ...
378 84 ; 378145 ;
Abstract
An X-ray mirror has a silicon carbide substrate having a convex cylindrical surface, and a carbon layer coated on a surface of said substrate to a thickness ranging from 10 nm to 1 .mu.m by evaporation, such as CVD. In the X-ray mirror in which the carbon layer is coated thereon beforehand, changes in the intensity of reflected light, caused by a contaminating carbon layer attached to the surface of the mirror, can be restricted. When such a mirror is used in an X-ray lithographic apparatus, the number of times the intensity of X-rays is measured or corrected or the mirror is cleaned can be greatly reduced.