The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 1995
Filed:
May. 11, 1994
Michael N Misheloff, Dublin, CA (US);
Balaji Krishnamachary, Fremont, CA (US);
Osman E Akcasu, San Jose, CA (US);
VLSI Technology, Inc., San Jose, CA (US);
Abstract
A method estimates source resistance for a transistor. A substrate region under a gate for the transistor is modeled as a gate region having a uniform resistivity .rho..sub.g. A source of the transistor is modeled as a source region having a uniform resistivity .rho..sub.s1. The uniform resistivity .rho..sub.g and the uniform resistivity .rho..sub.s1 are used to calculate a first current from the source of the transistor to a drain of the transistor. The source of the transistor is then modeled as a source region having another uniform resistivity .rho..sub.s2. The uniform resistivity .rho..sub.s2, is different in value than uniform resistivity .rho..sub.s1. The uniform resistivity .rho..sub.g and the uniform resistivity .rho..sub.s2 are used to calculate a second current from the source of the transistor to a drain of the transistor. The uniform resistivity .rho..sub.s1, the uniform resistivity .rho..sub.s2, the first current and the second current are used to calculate the source resistance for the transistor.