The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 1995
Filed:
Jan. 18, 1994
Shinji Yamada, Ohtsu, JP;
Masaharu Shirai, Ohtsu, JP;
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method for forming a wrinkle-free insulating layer from a resin having both photo-curing and thermosetting properties by reducing the magnitude of a concentration gradient of residual solvent in the thickness direction of the resin layer after drying the resin layer and prior to photo-curing, developing and thermosetting the resin layer. In one embodiment, such reduction is achieved by passing a substrate bearing the resin layer by a roll coater charged with a solvent for the resin, and allowing solvent to be absorbed by the resin layer. The solvent application roll can be spaced from the resin layer by a small gap such that solvent vapor is applied to the resin layer. Alternatively, solvent in liquid form can be applied to the resin layer. In another embodiment, the concentration gradient of residual solvent in the resin layer is reduced by affixing a barrier film to the resin layer and then heating the resin layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile