The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 1995
Filed:
Apr. 14, 1994
Kiyoteru Kobayashi, Hyogo, JP;
Isao Tottori, Hyogo, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
It is an object of the present invention to provide a method capable of performing surface treatment of a plurality of semiconductor substrates at one time and treating them uniformly with high selectivity. A plurality of semiconductor substrates having interlayer insulating films thereon are prepared. The plurality of semiconductor substrates are arranged in a vertical direction at predetermined intervals in a reaction chamber so that one face of each faces upwards and the other face of each faces downwards. Etching gas for etching the surfaces of the interlayer insulating films is sent into the reaction chamber in a direction vertical to the surfaces of said semiconductor substrates under low pressure.