The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 1995
Filed:
Jul. 22, 1994
Paul B Corkum, Gloucester, CA;
H C Liu, Orleans, CA;
National Research Council of Canada, Ottawa, CA;
Abstract
A method and apparatus is provided for propagating photoelectrons in a semiconductor material and for controlling the direction of photoelectrons produced in a semiconductor material. A selected region of the semiconductor material is irradiated with two beams of light that overlap in space and time. The two interfering light beams have a predetermined phase relationship and are harmonically related such that the frequency of one is approximately a multiple of two of the other. Each of the beams of light produce substantially a same number of photoelectrons in the semiconductor material. As the phase relationship between the two beams is varied, the direction of propagation of the photoelectrons produced, varies.