The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 17, 1995

Filed:

Oct. 12, 1993
Applicant:
Inventors:

Lie Shi, Charlotte, NC (US);

Dee A Ling, Charlotte, NC (US);

Michelle C Carter, Madison, NJ (US);

Assignee:

Hoechst Celanese Corporation, Somerville, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
E04H / ; D03D / ; D03D / ;
U.S. Cl.
CPC ...
428229 ; 135 87 ; 428225 ; 428373 ;
Abstract

A tent fabric constructed substantially of woven polyethylenenaphthalatebibenzoate (PENBB) yarns. The PENBB yarns of the fabric exhibit very low tenacity loss resulting from UV degradation, and exhibit very good dimensional stability, very low hot air shrinkage and very low creep. A flame retardant polymer may be added to the PENBB polymer before extrusion to provide flame resistance.


Find Patent Forward Citations

Shi, Lie. (1995). Uv-resistant and dimensionally stable tent comprising woven (U.S. Patent No. 5458956). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5458956

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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