The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 1995
Filed:
Nov. 07, 1994
Jong D Lee, Seoul, KR;
Korea Information & Communication Co., Ltd., Seoul, KR;
Abstract
The present invention provides for a method for manufacturing a field emitter array comprising the steps of depositing a silicon nitride mask pattern layer on the silicon substrate, forming a porous silicon layer in the substrate except in parts under the nitride mask patterns and oxidizing the porous silicon layer and the silicon substrate under the silicon layer, which results in formation of cone shape cathode tips. Further, gates corresponding to said cathode tips are provided by the conventional process or by process of depositing thin metal film and photoresist on the mask patterns and the porous silicon layer, etching the photoresist layer on the patterns, and then etching the metal film on the patterns, or by lift-off process.