The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 1995
Filed:
Mar. 29, 1991
Junji Hirokane, Tenri, JP;
Hiroyuki Katayama, Ikoma, JP;
Akira Takahashi, Nara, JP;
Tetsuya Inui, Nara, JP;
Kenji Ohta, Kitakatsuragi, JP;
Junichi Washo, Ikoma, JP;
Tomoyuki Miyake, Tenri, JP;
Kazuo Van, Nara, JP;
Michinobu Mieda, Tenri, JP;
Sharp Kabushiki Kaisha, Osaka, JP;
Abstract
A photo-mask and a method of manufacturing a photo-mask, which includes the steps of applying a resist film onto a substrate of quartz, glass and the like, subjecting the resist film to light exposure and development to form a fine resist pattern, etching the mask substrate covered by the fine resist pattern, causing a non-light transmitting thin film of Cr, Ta, etc. to adhere thereon by vapor deposition, sputtering and the like, and removing the thin film on the resist pattern together with the resist film, thereby to form the photo-mask.