The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 1995
Filed:
Apr. 25, 1994
Applicant:
Inventors:
Tetsuro Kuwayama, Yokohama, JP;
Yasuo Nakamura, Tokyo, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03H / ; G02B / ;
U.S. Cl.
CPC ...
359 10 ; 359 15 ; 359 35 ; 359900 ;
Abstract
This specification discloses a method of making a hologram imaged substantially without aberrations during the use when the wavelength of a light during the making differs from the wavelength of a light during the use and having high diffraction efficiency. In order to eliminate any aberration occuring when the hologram is used in a light beam of a different wavelength and to obtain high diffraction efficiency, a making light beam is caused to enter a predetermined coaxial optical system from outside the axis thereof to impart a suitable aberration, and a hologram is formed on a hologram sensitive material by the making light beam.