The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 26, 1995
Filed:
Nov. 09, 1993
Applicant:
Inventors:
Kunio Nakajima, Tokyo, JP;
Shuzo Sudo, Tokyo, JP;
Assignee:
Seiko Instruments, Inc., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K / ;
U.S. Cl.
CPC ...
378 84 ; 378 85 ; 378 70 ;
Abstract
An x-ray mirror material of high reflectance with a surface roughness which is very small and a high film density, the material being a Pt alloy film provided as a mirror surface for reflecting x-ray radiation. The composition of the mirror material is expressed by the general formula: Pt.sub.1-x M.sub.x. This material is deposited on a substrate surface which has been polished to a level form, where M is at least one substance selected from Mo, Ru, Rh, Pd, Ta, W, and Au, and x satisfies the formula: 0.005.ltoreq..times..ltoreq.0.10.