The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 26, 1995
Filed:
May. 27, 1994
Noriyuki Oka, Wakayama, JP;
Hiroaki Ikehara, Wakayama, JP;
Noritsu Koki Co., Ltd., Wakayama, JP;
Abstract
A negative film masking system for use in a photographic processing and printing machine includes a negative film masking assembly formed mainly of a mask and a negative film hold-down and a masking mount to which the negative film masking assembly is located. Photographic prints are produced from a negative film loaded in the negative film masking assembly and having standard size frames and panoramic size frames in random combination. A panoramic size frame is designated by masking both widthwise edges of the film in shooting to make two unexposed regions in a standard frame. The negative film masking system further includes a four-sided film gate aperture in the mask and which is identical in the size to the panoramic size frame and a four-sided film gate aperture in the negative film hold-down which is identical in the size to the four-sided film gate aperture of the mask. Detecting apertures in particular positions of the mask are spaced from the four-sided film gate aperture thereof at locations in the unexposed regions of the panoramic size frame. Detecting apertures in the negative film hold-down communicate with the detecting apertures of the mask.