The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 1995
Filed:
Sep. 20, 1993
Yuji Nishio, Kanagawa, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
A method of making a two-dimensional exposure on an object with a plurality of light beams by a main scan for making scans with the light beams in one direction and a sub-scan for making scans with the light beams in a direction intersecting the direction of the main scan. In a distance detecting step, a distance between a portion exposed to at least one of the plurality of light beams and a portion exposed to respective other light beams is detected when respective the plurality of light beams are exposed toward an object. In an exposure start-timing changing step, the timing for starting an exposure to be effected by at least one of the main scan and sub-scan made with respective the plurality of light beams is changed according to the distance in such a manner that the positions of the portions exposed to the plurality of light beams are substantially identical.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile