The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 1995
Filed:
May. 20, 1994
U.S. Philips Corporation, New York, NY (US);
Abstract
In charge coupled imaging devices, a major portion of the photosensitive surface area is covered by electrodes with which the charge storage and the charge transport in the semiconductor body are controlled. These electrodes are preferably made of polycrystalline silicon. This material, however, like other conductive materials known per se, has a comparatively high absorption coefficient, in particular in the short-wave portion of the visible spectrum (blue), which adversely affects the sensitivity. According to the invention, the electrodes are manufactured partly from a very thin poly layer, preferably not thicker than 50 nm, and partly from a less transparent but higher conductivity layer, for example, poly of much greater thickness. The electrodes are so provided that the major portion of the surface area is covered by the thin, transparent layer and only a comparatively small portion by the less transparent, thick poly layer, parts of the latter being in addition used for the electrical connection of the electrodes made from the very thin poly.