The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 1995
Filed:
Jul. 20, 1993
Applicant:
Inventor:
Satoshi Takaki, Yokohama, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K / ; H05B / ;
U.S. Cl.
CPC ...
21912143 ; 21912142 ; 21912147 ; 219748 ; 20429802 ; 20429838 ; 427575 ;
Abstract
A process for forming a deposited film on a substrate by microwave plasma CVD comprises holding a substrate in a pressure-reducible reactor vessel, introducing microwave energy into the reactor vessel from at least three microwave-introducing means attached thereto for introducing the microwave energy into the reactor vessel while introducing a raw material gas into the reactor vessel, and forming plasma in the reactor vessel by the microwave energy, thereby forming a deposited film on the surface of the substrate.