The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 05, 1995
Filed:
Apr. 05, 1994
Raymond Florens, Edegem, BE;
Pieter Perdieus, O.L.V.Waver, BE;
Peter Willems, Stekene, BE;
Freddy Henderickx, Olen, BE;
AGFA-Gevaert, N.V., Mortsel, BE;
Abstract
To eliminate the 'pi-line' artefact after processing a method of image formation in a silver halide industrial X-ray photographic material is disclosed wherein said material comprises on at least one side of a support, at least one gelatino silver halide emulsion layer and a total amount of silver halide, corresponding to from 6 to 20 g of silver nitrate per square meter and per side, and at least one non-sensitive protective antistress coating and wherein said method proceeds by the steps of exposing said material to direct X-rays and processing the material in an automatic processing machine by development, fixing, rinsing and drying, characterized in that said material further comprises at least one vinyl sulphone compound as a hardening agent in at least one of its hydrophilic layers, that development occurs in a developer comprising as a surfactant at least one anionic alkylphenoxy and/or alkoxy polyalkyleneoxy phosphate ester, sulphate ester, alkyl carboxylic, sulphonic or phosphonic acid and/or a salt thereof and that fixing occurs in a fixer which may comprise at least one alpha-ketocarboxylic acid.