The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 29, 1995
Filed:
Aug. 10, 1993
Qing X Ru, Namegawa, JP;
Junji Endo, Sakado-shi, Saitama 350-02, JP;
Akira Tonomura, Hatoyama-machi, Hiki-gun, Saitama 350-03, JP;
Research Development Corporation of Japan, Tokyo, JP;
Other;
Abstract
An interference device and method for observing phase information, using electron or other waves with the amplitude difficult to split by a half mirror. Using an interference device comprising in combination two scattering films A1 and A2 capable of scattering incident waves randomly, first lens systems B1 and B2 that are located between said two scattering films to form the image of one scattering film A1 on the other scattering film A2, a second lens system B3 for forming on an observation surface C the image of a specimen 2 located at a position where a component going straight through said one scattering film is converged in a spot form through said first lens system or a part thereof, and means for recording an interference pattern formed on the observation surface C, an interference pattern is detected while the specimen 2 is inserted in the arrangement, and an interference pattern is detected while the specimen 2 is removed from the arrangement, so that the difference between both the interference patterns, or the sum or product of them, can be found to observe the phase information of the specimen directly as interference fringes.