The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 29, 1995

Filed:

Aug. 25, 1994
Applicant:
Inventors:

Sudhir D Savkar, Schenectady, NY (US);

Walter Whipple, III, Amsterdam, NY (US);

Lawson P Harris, Scotia, NY (US);

Assignee:

General Electric Company, Schenectady, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01F / ;
U.S. Cl.
CPC ...
7386112 ; 75331 ;
Abstract

This invention relates to an apparatus and method for directly measuring the bottom pour flow rate from heated ceramic crucible, hearth/tundish combinations used in metals refining/processing industry, plasma arc melting process (PAM), a cold hearth process or other similar processes such as for pouring ingots. Such structures of this type generally allow the bottom pour flow rate to be accurately measured in relative real time without adversely affecting the flow while withstanding the hostile surroundings typically associate with a heated crucible, tundishes, PAM, cold hearth process or other similar processes.


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