The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 1995
Filed:
Jul. 31, 1991
Applicant:
Inventor:
Naoyuki Kai, Tokyo, JP;
Assignee:
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T / ;
U.S. Cl.
CPC ...
395134 ; 395133 ;
Abstract
A pattern generation scheme is initiated by abstaining flag information for filling a pattern is obtained from data of an outline quantized on a bit map. The flag information of the outline is written in a work memory for filling, and a filling pattern is obtained in a scanning direction on the bit map. When a drawing point for filling is present outside a work area of the work memory and in scanning start direction on a scan line, a flag for filling is written in a scanning start point in the work area. Even when the outline overflows the work area, a pattern for correctly filling the interior of the outline in the work area can be generated.