The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 1995
Filed:
Sep. 02, 1994
Klaus-Michael Mayer, Gerlingen, DE;
Robert Bosch GmbH, Stuttgart, DE;
Abstract
Proposed is an integrated optical component, particularly a modulator, directional coupler, switch, polarizer, distributor or the like, as well as a method of producing such a component. The component has a light waveguide (17) of an optical polymer which is disposed on a silicon substrate (10) that has at least one optical buffer layer (14) having a low refraction index, wherein a positioning trench (12) that is anisotropically etched into the substrate (10), is essentially aligned with the light waveguide (17) and has a V-shaped cross-section is provided for receiving a glass fiber (11) to be coupled to the coupling end surface (18) of the light waveguide by means of end-to-end coupling. The positioning trench (12) is filled with a plastic material (15) at the end region on the coupling side, wherein the light waveguide (17) extends on the plastic material (15) up to an end surface (18) of the plastic material (15) which extends perpendicular to the axial direction of the light waveguide (17) and lies in the plane of the coupling end surface. This end surface (18) is disposed outside of a diagonally-extending end region (13) of the positioning trench (12). The end surface (18) and thus the coupling end surface can therefore be created in a simple manner by means of laser machining processing, in which the established technology for producing the positioning trench by means of anisotropic etching can be used.