The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 22, 1995

Filed:

Nov. 30, 1993
Applicant:
Inventor:

Tadashi Kitamura, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
250307 ;
Abstract

A method of automatically setting a coordinate conversion factor in which, under the condition where a sample having a simple contour, such as a wafer with a known contour, is installed in a shape observing unit, in order to determine the conversion factor between a coordinate system defined by the contour of the sample and a control coordinate system for an observing position such as a stage coordinate system, the edge position of the contour of the sample is automatically recognized at a high accuracy from a secondary electron picture which has been obtained from the shape observing unit, from the result of which the conversion factor between the sample coordinate system and the stage coordinate system is automatically set.


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