The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 1995
Filed:
Oct. 12, 1994
Applicant:
Inventors:
Yuka Yamada, Kanagawa, JP;
Katsuhiko Mutoh, Kanagawa, JP;
Assignee:
Matsushita Research Institute Tokyo, Inc., Kanagawa, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
118722 ; 118699 ; 118705 ; 118708 ; 118712 ; 118 501 ;
Abstract
A thin film is formed on a substrate in a reaction chamber using a photo CVD technique by decomposing a reactive gas supplied to the reaction chamber by means of light irradiated through a light introducing window. The reduction in film deposition rate due to clouding of the light introducing window is corrected in order to form a thin film of a desired film thickness.
Published as:
JPH04358075A; EP0521615A2; EP0521615A3; US5443646A; EP0521615B1; DE69222892D1; DE69222892T2; JP3002013B2;