The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 22, 1995
Filed:
Jun. 08, 1992
Miroslav Vichr, Emmaus, PA (US);
David S Hoover, New Tripoli, PA (US);
Air Products and Chemicals, Inc., Allentown, PA (US);
Abstract
A method is disclosed for producing large single crystals. In one embodiment, a single crystal of electronic grade diamond is produced having a thickness of approximately 100-1000 microns and an area of substantially greater than 1 cm..sup.2. and having a high crystalline perfection which can be used in electronic, optical, mechanical and other applications. A single crystalline diamond layer is first deposited onto a master seed crystal and the resulting diamond layers can be separated from the seed crystal by physical, mechanical and chemical means. The original master seed can be restored by epitaxial growth for repetitive use as seed crystal in subsequent operations. Large master single crystal diamond seed can be generated by a combination of oriented smaller seed crystals by lateral epitaxial fusion. Since there is no limit to how many times seed combination step can be repeated, large diamond freestanding wafers comparable in size to silicon wafers can be manufactured.