The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 15, 1995
Filed:
Sep. 30, 1993
G Chris Dobrin, Cincinnati, OH (US);
Donna S Phillips, Cincinnati, OH (US);
The Procter & Gamble Company, Cincinnati, OH (US);
Abstract
A continuous, multi-phase process for microaperturing and microembossing a substantially continuous web of substantially planar polymeric film to conform with the image of multiple forming structures, each having a patterned forming surface with a multiplicity of fine-scale apertures and an opposed surface. Each forming structure is open from the apertures in the forming surface to its opposed surface. The web of film has an indefinite length, a first surface, a second surface and a thickness. The thickness is the distance between the first surface and the second surface. The process includes at least two sequential forming phases, one of which involves aperturing of the web of film to coincide with fine-scale apertures in the first forming structure and another of which involves conformance of the web of film to the profile of the fine-scale apertures in the second forming structure.