The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 15, 1995

Filed:

Apr. 11, 1994
Applicant:
Inventors:

Chung Chan, Newton, MA (US);

Ryne C Allen, West Roxbury, MA (US);

Zhong-Yi Xia, Brookline, MA (US);

Assignee:

Northeastern University, Boston, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20429841 ; 20419238 ; 427580 ;
Abstract

An anodic vacuum arc deposition system for rapidly depositing a high quality, small grain size, coating on a workpiece. The anodic vacuum arc deposition system includes an arc initiator and an anodic electrode having a continuous feed. The anodic vacuum arc deposition system may be configured with a coaxial anode and cathode. A plurality of coaxial electrodes may used to deposition-coat a large area and/or to sequentially deposit a series of layers each of a different material. In one embodiment, a low current triggered anodic vacuum arc with a continuous wire feed mechanism provides the user with a self-contained high differential metal plasma spray. This apparatus provides coatings with properties similar to coatings from a basic anodic arc deposition source but can be self-ignited, continuously run, and made highly mobile for greater coverage control. An alternative embodiment of this device incorporates a cathodic arc source which supplies ions to both ignite the anodic arc and to enhance the ion population of the anodic arc metal flux for greater control over the deposition process via substrate biasing and magnetic focusing, and the degree of ionization at the substrate.


Find Patent Forward Citations

Chan, Chung. (1995). Triggered vacuum anodic arc (U.S. Patent No. 5441624). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5441624

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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