The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 15, 1995

Filed:

Apr. 11, 1994
Applicant:
Inventors:

Chung Chan, Newton, MA (US);

Ryne C Allen, West Roxbury, MA (US);

Assignee:

Northeastern University, Boston, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20419238 ; 20429841 ; 427580 ;
Abstract

An anodic vacuum arc deposition system for rapidly depositing a high quality, small grain size, coating on a workpiece. The anodic vacuum arc deposition system includes an arc initiator and an anodic electrode having a continuous feed. The anodic vacuum arc deposition system may be configured with a coaxial anode and cathode. A plurality of coaxial electrodes may used to coat a large area and/or to simultaneously deposit two or more different materials for multi-layer or alloy coating. Several material recovery systems including both methods and devices for recovery of the undeposited anodic arc coating material minimize the anode source waste such that selective coatings may be applied with virtually all excess coating material recovered for reuse. In one embodiment, an anode shield is made of the same material as the anode source material. After the deposition process is complete, captured material is recovered for future reuse by removing the anode shield and reprocessing it into anode source material. In another embodiment, unused source material condenses onto the inner surface of an containment collar and is gravitationally forced back toward the anode to be immediately vaporized for reuse. In a third embodiment, a geometric arrangement of substrates with an isotropic anodic arc at the center optimizes coating efficiency by maximizing the substrate area exposed to the vaporized material.


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