The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 1995

Filed:

May. 11, 1992
Applicant:
Inventors:

Bennie M Lucas, Odessa, TX (US);

V Krishnamurthy, Odessa, TX (US);

John R Bonser, Odessa, TX (US);

Assignee:

Rexene Corporation, Dallas, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08J / ;
U.S. Cl.
CPC ...
522157 ; 522 76 ; 522 78 ; 522 79 ; 522161 ; 525240 ;
Abstract

Polymer compositions having improved resistance to thermoforming sag are disclosed. The compositions comprise a first and second portion selected from the group comprising polypropylene, propylene-ethylene copolymers and mixtures thereof wherein a first portion of the composition is (1) mixed with from about 500 to about 3000 ppm of antioxidant; and (2) irradiated with a dosage of from about 10 to about 20 Mrads gamma or electron beam of ionizing radiation in air, and the second portion of said polymer composition is non-irradiated. The first portion is present in an amount effective, from about 1.0% to about 10.0%, to increase the elasticity of the polymer composition in the molten state by at least 10% as compared to the second portion of said polymer composition.


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