The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 1995
Filed:
Nov. 05, 1993
Applicant:
Inventors:
Sailesh Chittipeddi, Whitehall, PA (US);
William T Cochran, New Tripoli, PA (US);
Assignee:
AT&T Corp., Murray Hill, NJ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
437192 ; 437228 ;
Abstract
A method for etching metal conductors and stacks of conductors is disclosed. A doped silicon dioxide layer is deposited upon a metal or stack of conductive layers to be etched. A silicon dioxide layer is doped with phosphorous. Next, the silicon dioxide layer is partially etched and the photoresist removed. Subsequent etching utilizes the raised feature created in the silicon dioxide layer as a mask to etch the underlying metal or stack of conductors.