The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 1995
Filed:
Jan. 21, 1994
Applicant:
Inventor:
Hiroshi Nomura, Shorewood, MN (US);
Assignee:
NeoMecs Incorporated, St. Louis Park, MN (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B / ; B01D / ;
U.S. Cl.
CPC ...
4283084 ; 210490 ; 427489 ; 427491 ; 427495 ; 4283139 ; 4283142 ; 4283157 ; 4283159 ; 4283199 ; 428447 ; 428451 ;
Abstract
Plasma polymerization of a fully alkylated disiloxane is greatly enhanced by the addition of oxygen to the plasma feed gases. Deposition rate of polysiloxane polymerizate upon substrates is increased, and the deposits are nontacky. Composite permselective membranes made by deposition of plasma-polymerized polysiloxanes in the presence of oxygen are useful for applications such as gas separations. Composite hollow fiber membranes of polysiloxane polymerizate on porous polypropylene exhibit oxygen/nitrogen permselectivities greater than 2.3 combined with increased oxygen permeability.