The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 1995
Filed:
Dec. 08, 1993
Applicant:
Inventor:
Hiroshi Uchiyama, Hirakata, JP;
Assignees:
E. C. Chemical Co., Ltd., Osaka, JP;
Itochu Fine Chemical Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05F / ;
U.S. Cl.
CPC ...
204164 ; 588210 ; 588212 ; 588227 ;
Abstract
A method for treating ozone layer depleting substances, in which a gaseous composition comprising helium or argon or a mixture thereof, or a gaseous mixture of argon and acetone, is introduced into a plasma reactor having a dielectric-coated electrode comprising a solid dielectric disposed on the surface of at least one of opposing electrodes, an atmospheric pressure glow discharge is generated in the gaseous atmosphere, gaseous ozone layer depleting substances are introduced into the glow discharge to decompose the substances, and resulting decomposition products are absorbed in water.