The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 1995
Filed:
Apr. 01, 1994
Kabushiki Kaisha Barudan, Ichinomiya, JP;
Ippon Denpa Co., Ltd., Tokyo, JP;
Abstract
A method of creating data for an applique which has its lower and upper applique patches embroidered to lower and upper cloths, respectively, such that the lower cloth and applique patch and the upper cloth and applique patch can overlap and separate each other with a predetermined overlap margin. The applique data creating method includes the steps of: inputting synthetic contour data of the two applique patches when the lower and upper applique patches overlap each other with the predetermined overlap margin; inputting the individual overlap edge data of the lower and upper applique patches; creating the individual contour data of the lower and upper applique patches from the synthetic contour data and the individual overlap edge data; and creating the individual embroidering data of the lower and upper applique patches on the basis of the individual contour data of the lower and upper applique patches.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile