The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 1995
Filed:
Feb. 23, 1993
Michael B Brandt, Walworth, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
A uniform reflectance mirror deflector of an optical scanner for scanning a light beam onto an image object or a receiving medium. The scanner includes a rotatable polygon-shaped mirror having a plurality of planes reflective mirror facets for deflecting and thereby scanning the beam through a predetermined angle while rotating and thereby varying the angle of incidence of the light beam on the deflector. In order to achieve relative uniformity of reflectance and avoid intensity variations in the reflected beam, a protective optical coating layer is selected to have a thickness which minimizes variation in reflectance over the range of angular displacement of the mirror in relation to the light source during its rotation. The thickness of the protective coating layer uniformly applied over the entire surface of each facet of the polygon-shaped mirror is determined by calculating the reflectance of P-polarized and S-polarized incident radiation components at a predetermined wave length of incident radiation over a range of protective coating film thicknesses of between 0 and one wave length and over the range of angles of incidence. Coating thicknesses in this range are selected in accordance with the resulting demonstrated relative uniformity of reflectance.