The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 01, 1995
Filed:
Mar. 31, 1994
Goldstar Electron Co., Ltd., , US;
Abstract
An edge enhancement phase shifting mask having a recessed opaque layer which optimally exhibits the phase shifting effect at edge portion is disclosed, wherein the mask comprises a transparent substrate having at least one or more trenches spaced apart from each other by a predetermined distance, an opaque layer filling some portion of the trench, and a phase shifting layer formed on the substrate area between the trenches. And the method of manufacturing such a mask comprises the steps of forming a first photoresist pattern by etching the coated photoresist film on a transparent substrate, forming at least one or more trenches by etching the transparent substrate masked with the patterned photoresist layer, forming a opaque layer occupying some portion of the trench through etch back process applying to a deposited metal layer on the whole surface of the substrate, forming a phase shifting layer over the surface of the non-etched transparent substrate and exposing a substrate area between the phase shifting layer and the opaque layer.