The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 01, 1995

Filed:

Nov. 15, 1993
Applicant:
Inventor:

Virgle L Hedgcoth, Pomona, CA (US);

Assignee:

Telic Technologies Corporation, Santa Monica, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
20429821 ; 20429812 ; 20429818 ; 20429826 ; 20419212 ;
Abstract

The invention is an expandable magnetron sputtering system based on an elongated hollow cylindrical cathode member. A magnetic field is provided parallel to an axial wall of the hollow cathode member to create a physical trap for containing a glow discharge therein. Removable end plugs are provided, if necessary, to help create the physical trap. The hollow cathode member may be solid or any contain one or more slots, as appropriate, for the substrate to be coated (filament-like versus planar) and the mode of operation selected (pass-by versus pass-through). The cathode members may be connected together (with anodes as needed) to extend the length of a sputtering path. A plurality of single-slot cathodes may be cost effectively formed and operated in a single monolithic slab of material.


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