The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 01, 1995

Filed:

Dec. 16, 1993
Applicant:
Inventors:

Ronald B Kaplin, Lewiston, NY (US);

Chao-Peng Chen, Grand Island, NY (US);

Tilak V Bommaraju, Grand Island, NY (US);

Assignee:

Occidental Chemical Corporation, Niagara Falls, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D / ;
U.S. Cl.
CPC ...
95182 ; 95233 ; 4232 / ; 4232451 ; 423503 ;
Abstract

Disclosed is a method to be practiced in a gas purification apparatus that is suitable for contacting a chlorine-containing mixture of gases with carbon tetrachloride in order to remove one of the gases from the mixture. The gas removed can be either chlorine or another gas such as nitrogen trichloride. In the method of the invention, one of the gases is removed from the mixture in that apparatus without using carbon tetrachloride by contacting the chlorine-containing gas mixture in the apparatus with a chlorinated organic liquid which can either be chloroform or ethylene dichloride.


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