The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 25, 1995
Filed:
Mar. 12, 1993
Kabushiki Kaisha Toshiba, Kanagawa, JP;
Abstract
A mask for evaluation of an aligner includes, on a transparent substrate, a plurality of resistance measurement pattern blocks each including a plurality of resistance measurement patterns which have shapes identical to each other. Resistance values of respective measurement patterns of conductive film portions on a substrate exposed and formed by using a mask having a plurality of the same measurement patterns vary in dependency upon the accuracy of a lens, etc. of the aligner. Accordingly, this evaluation mask is used to carry out exposure process to etch a conductive film to measure resistance values of the conductive film portions to compare them to each other, thereby making it possible to carry evaluation of an aligner including evaluation of a lens therefor.