The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 1995
Filed:
Feb. 23, 1994
Jun Hiraki, Yokohama, JP;
Hiroshi Morita, Yokohama, JP;
Chisso Corporation, Osaka, JP;
Abstract
The present invention provides variant strains mass-producing .epsilon.PL which are obtained by variant treatment of a strain producing .epsilon.PL. For using the variant strains, the strains are cultured in a cultivated medium, .epsilon.PL is mass-produced and stored in the culture solution, and the stored .epsilon.PL is collected from the solution. For producing .epsilon.PL, a strain which produces .epsilon.PL is variant-treated, the obtained variant strain is cultivated in a culture medium to which L-lysine or L-lysine and one or more sugars are added, .epsilon.PL is mass-produced and stored in the culture solution, and the stored .epsilon.PL is collected from the solution. The variant strains producing .epsilon.PL in large quantities are preferably the strains which have tolerance to an analogue of L-lysine of Streptomyces albulus subsp. lysinopolymerus No. 346-D strain and plasmid-amplifiable variant strains of the same bacteria.