The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 1995
Filed:
Sep. 30, 1993
Applicant:
Inventor:
John L Cain, Schertz, TX (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
1566621 ;
Abstract
This invention is directed to a plasma etching process for the etching of bi-layer passivation films comprising silicon nitride and silicon oxide wherein the etching gas is a selectivity enhancing ratio of gases selected from the group consisting of CHF.sub.3 /SF.sub.6, CHF.sub.3 /O.sub.2, and CHF.sub.3 /C.sub.2 F.sub.6.
Quick Actions:
Cain, John. (1995). Selective dry-etching of bi-layer passivation films (U.S. Patent No. 5433823). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5433823
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile