The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 1995
Filed:
Oct. 04, 1993
Yasuhiro Mochizuki, Katsuta, JP;
Naohiro Momma, Hitachi, JP;
Shigeru Takahashi, Hitachiota, JP;
Takuya Fukuda, Hitachi, JP;
Noboru Suzuki, Hitachi, JP;
Tadasi Sonobe, Iwaki, JP;
Kiyoshi Chiba, Hitachi, JP;
Kazuo Suzuki, Hitachi, JP;
Hitachi, Ltd., Tokyo, JP;
Hitachi Service Engineering Co., Ltd., Hitachi, JP;
Abstract
A plasma treatment apparatus for forming a thin film on a substrate in a vacuum vessel includes a magnetic field generator which can be positioned inside or outside the vacuum vessel, and a microwave source. The magnetic field strength is controllable such that an electron cyclotron resonance (ECR) area is defined near the substrate. The magnetic field generator can be arranged so that plasma and reactive gas introduction ports are on the microwave introduction side of the ECR area and the substrate is on the opposite side of the ECR area. Alternatively, a gas introduction port can be positioned such that reactive gas is introduced into the ECR area or onto the substrate.