The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 1995
Filed:
Sep. 29, 1994
Robert E Zahuta, Lompoc, CA (US);
Leonard E Peck, Jr, Goleta, CA (US);
Santa Barbara Research Center, Goleta, CA (US);
Abstract
A dewar assembly is cleaned, baked out, assembled, and joined in a single vacuum system without exposing the components to ambient atmosphere. The vacuum system preferably has a first chamber with multiple subchambers that can be isolated from each other, and a second chamber that can be isolated from the first chamber. The multiple chambers and subchambers prevent cross contamination during the various process steps, and also permit multiple dewar assemblies to be batch processed at different stages simultaneously. The components of the dewar assembly are loaded into one subchamber and cleaned, and thereafter moved to another subchamber for bakeout. The dewar getter is heated in the second chamber and moved to one of the subchambers for assembly. The components of the dewar assembly are assembled and joined.