The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 11, 1995

Filed:

Feb. 07, 1994
Applicant:
Inventor:

Masaaki Doi, Yokohama, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B / ;
U.S. Cl.
CPC ...
385132 ; 385 14 ; 385129 ;
Abstract

A first region diffused with a first diffusion material containing at least one element and a second region diffused with a second diffusion material containing at least another element are formed in a substrate. At least part of the second region overlaps part of the first region. A region of the first region which does not overlap the second region has a refractive index higher than that of a region where the first region overlaps the second region and that of the substrate. The region of the first region which does not overlap the second region serves as a core for propagating a light beam. The region where the first region overlaps the second region and the region of the substrate not diffused with the first and second diffusion materials serve as a clad.


Find Patent Forward Citations

Loading…