The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 11, 1995
Filed:
Oct. 25, 1993
Toshiro Kisakibaru, Tokyo, JP;
Akira Kojima, Kanagawa, JP;
Takayuki Fukunaga, Tokyo, JP;
Yoshinori Hata, Kanagawa, JP;
Yasushi Kato, Kanagawa, JP;
Isao Honbori, Kanagawa, JP;
Tomohide Jozaki, Kanagawa, JP;
Hirohisa Kooriyama, Kanagawa, JP;
Sony Corporation, Tokyo, JP;
Abstract
A plasma treatment method and system allowing the plasma intensity to be controllably distributed perpendicularly to the inner wall and ensuring effective and uniform treatment in the case of executing plasma cleaning, plasma CVD, RIE or the like. In the plasma treatment where plasma is generated within a chamber 1 for plasma treatment, magnetic field 31 is applied perpendicularly to the inner wall of the chamber to produce plasma whose intensity is directed perpendicularly to the inner wall of the chamber or in parallel with the surface to be treated. Further, the magnetic filed 31 rendered into a revolving field 32 may be applied to rotate the plasma to accomplish a uniform and effective treatment.