The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 1995
Filed:
Oct. 04, 1993
Aaron M Divinsky, Mississauga, CA;
Brian J Goldberg, Thornhill, CA;
Alexander Nicolaou, Mississauga, CA;
Anastasios Tsonis, Village of Conestogo, CA;
Pulse Microsystems, Ltd., Mississauga, CA;
Abstract
A method for creating a self-generating embroidery design pattern, which may be provided alone or merged with an existing pattern comprising the steps of defining a predetermined fractal shape having an associated axiom and production rules; parsing the axiom and production rules associated with the defined fractal shape and performing the production rules a selectable predetermined number of times for providing a plurality of stitch or outline points in accordance with a desired finished embroidery design pattern size, the stitch points being in either an outline data format or a stitch data format; converting the outline data format into a stitch data format; and translating the stitch data format into a predetermined embroidery language machine code for controlling an associated embroidery machine responsive to the predetermined embroidery language machine code.