The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 1995
Filed:
Oct. 05, 1994
Yukako Matsumoto, Kawasaki, JP;
Akira Miyaji, Tokyo, JP;
Nikon Corporation, Tokyo, JP;
Abstract
An exposure apparatus comprises a light source emitting light of the ultraviolet region; an illuminating system for introducing the light from the light source into a mask bearing a predetermined pattern; an exposure unit for forming the image of the mask pattern on a photosensitive substrate; a chamber accommodating the light source, the illuminating system and the exposure unit; and an impurity eliminating device for eliminating at least an organic impurity inducing a photochemical reaction with the light of the ultraviolet region.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile