The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 1995
Filed:
Aug. 20, 1993
Thomas W Karpen, Skaneateles, NY (US);
Kenneth A Wright, Syracuse, NY (US);
Gerard F Beckhusen, Liverpool, NY (US);
Mark A McClaude, Syracuse, NY (US);
William H Lagerway, Auburn, NY (US);
Jeffrey B Powers, Skaneateles, NY (US);
Theresa M West, Skaneateles, NY (US);
Welch Allyn, Inc., Skaneateles Falls, NY (US);
Abstract
There is disclosed an apparatus for illuminating a sensing region having an object therein, comprising a reflector that is elongated in a first plane, the reflector having a width dimension that is less than a width dimension of a sensing region to be illuminated, and further having a first curved profile in the first plane about a center of curvature. In a preferred embodiment the reflector is disposed between the center of curvature and the sensing region. In a second plane which is orthogonal to the first plane and includes the center of curvature, a reflecting surface of the reflector has a second curved profile. A plurality of substantially Lambertian light sources each face the reflector for directing light thereto generally in a direction of the center of curvature for reflection toward the sensing region. The second profile preferably comprises a portion of an ellipse and a light source is disposed substantially at a primary focus thereof. The second profile preferably has a gap for transmitting retroreflected light generated within the sensing region therethrough. An upper portion of the second profile comprises a portion of a first surface of revolution selected from the group of ellipse and parabola, and the lower portion of the second profile can comprise a portion of a second surface of revolution selected from the group of ellipse and parabola, a light source being disposed at a focus of each of the first surface of revolution and the second surface of revolution. The assembly is combined in a scanner for reading optical patterns.