The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 1995
Filed:
Feb. 03, 1994
Robert W Fiordalice, Austin, TX (US);
Faivel S Pintchovski, Austin, TX (US);
Motorola, Inc., Schaumburg, IL (US);
Abstract
A process for fabricating a metallization structure includes the formation of an interlayer (20) using an MOCVD deposition process. A metal-organic precursor, having as one component tungsten, is used to deposit the interlayer (20) onto a surface region (18) of a substrate (10) at the bottom of an opening (16). The MOCVD deposition process forms a conformal layer which evenly coats all surfaces of the opening (16). Next, a refractory metal layer (22) is deposited to overlie the interlayer (20). Because of conformal nature of the MOCVD deposition process, refractory metal layer can be formed using corrosive gasses such as tungsten hexafluoride.